Densimetric albedo method for control of coating thickness using monoenergetic electorns

A technique of coating thickness control according to electron backscattering, based on the dependence of the distribution of the backscattered electron flux over the coating surface on the densities and atomic numbers of sublayer and coating materials is developed. The technique permits to increase the sensitivity to the coating thickness variations for a number of material combinations. In case of great difference in material densities the method makes it possible to control the coating thickness with the sensitivity of 2-5% when the differences in atomic numbers are up to 20%