High-resolution X-ray photoelectron spectroscopy study of InTe thin film in structural phase transition from amorphous to crystalline phase
Creators
- 1. Priority Research Centers Program, University of Ulsan, Ulsan 680-749 (Korea, Republic of)
- 2. Department of Physics, Kyung Hee University, 1 Hoegi-Dong, Seoul 130-701 (Korea, Republic of)
- 3. Department of Material Science and Engineering, KAIST, 335 Gwahagno, Yuseong-gu, Daejeon 305-701 (Korea, Republic of)
- 4. Beamline Division, Pohang Accelerator Laboratory, Pohang 790-784 (Korea, Republic of)
- 5. Semiconductor Materials and Devices Lab., Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 136-650 (Korea, Republic of)
Description
We investigated the chemical states of InTe thin film in the structural phase transition from the amorphous to the crystalline phase, using high-resolution X-ray photoelectron spectroscopy with synchrotron radiation. We confirmed the structural phase transition by transmission electron microscopy. Clean amorphous InTe (a-InTe) free of oxygen impurity was obtained after Ne+ ion sputtering at the ion beam energy of 1 kV for 1 h. Additionally, we obtained crystalline InTe (c-InTe) from clean a-InTe by annealing at 250 oC in an ultra-high vacuum. During the transition to the crystalline phase, the binding energy of the Te 4d core-level was unchanged, but the peak width was somewhat wider than in the amorphous phase. In the case of the In 4d core-level, the chemical shift was 0.1 eV at the higher binding energy between the amorphous and crystalline phases. The valence band maximum was shifted at the higher binding energy of 0.34 eV. We assumed that the Te atom was almost fixed and that the In atoms moved in the tight binding energy state to the center of the 4-Te atoms.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2010.02.013Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2010.02.013;
- PII
- S0040-6090(10)00195-1;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 518
- Journal Issue
- 15
- Journal Page Range
- p. 4442-4445
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42054961
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- AMORPHOUS STATE; ANNEALING; BINDING ENERGY; CHEMICAL SHIFT; CHEMICAL STATE; CRYSTALS; INDIUM TELLURIDES; ION BEAMS; MILLI EV RANGE; NEON IONS; PHASE TRANSFORMATIONS; SPUTTERING; SYNCHROTRON RADIATION; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- BEAMS; BREMSSTRAHLUNG; CHALCOGENIDES; CHARGED PARTICLES; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ENERGY; ENERGY RANGE; FILMS; HEAT TREATMENTS; INDIUM COMPOUNDS; IONS; MICROSCOPY; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SPECTROSCOPY; TELLURIDES; TELLURIUM COMPOUNDS; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.