Published March 1987 | Version v1
Journal article Metadata-only

Electrodeposition of indium

Creators

  • 1. Mansoura Univ. (Egypt)
  • 2. Tanta Univ. (Egypt)

Description

Metallic indium was deposited from aqueous solutions of indium trichloride containing also, acetate, thiocyanate, chloride, iodide, sulphate, oxalate, ethanol, acetamide and citrate of sodium or potassium. The optimum conditions are: pH 2-5, current density 2-25 mA cm-2, temperature 30OC and metal ion concentration O.2 mol l-1. Deposits have been obtained on a platinum sheet cathode. Chemical analysis reveals that the purity of the indium is better than 99%. The rate of deposition is also determined. 15 refs

Additional details

Publishing Information

Journal Title
Bull. Soc. Chim. Fr.
Journal Issue
no.2
Series
Bull. Soc. Chim. Fr.
ISSN
0037-8968
CODEN
BSCFA

INIS

Country of Publication
France
Country of Input or Organization
France
INIS RN
18098130
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
AQUEOUS SOLUTIONS; CURRENT DENSITY; ELECTRODEPOSITION; INDIUM; MEDIUM TEMPERATURE; PH VALUE; QUANTITY RATIO
Descriptors DEC
DEPOSITION; DISPERSIONS; ELECTROLYSIS; ELEMENTS; HOMOGENEOUS MIXTURES; METALS; MIXTURES; SOLUTIONS; SURFACE COATING