Published May 26, 2008 | Version v1
Journal article Metadata-only

Reduction of debris of a CO2 laser-produced Sn plasma extreme ultraviolet source using a magnetic field

Creators

  • 1. EUVA - Extreme Ultraviolet Lithography System Development Association, 1200 Manda, Hiratsuka, Kanagawa, 254-8567 (Japan)
  • 2. Department of Energy and Environmental Science, Graduate School of Engineering, and Center for Optical Research and Education (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 Japan (Japan)

Description

We demonstrated a fivefold reduction in Sn debris deposited on small Mo/Si multilayer mirrors from a Sn planar target by applying a static magnetic field of 1 T. The debris reduction is attributed to the decrease of more than three orders in the number of ions that reach the sample mirror due to their interaction with the applied magnetic field that guides the ions away from the mirror. The remaining deposition is due to neutral Sn atoms that do not interact with the applied magnetic field

Additional details

Identifiers

DOI
10.1063/1.2938365;

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
92
Journal Issue
21
Journal Page Range
p. 211503-211503.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39112232
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CARBON DIOXIDE LASERS; DEPOSITION; EXTREME ULTRAVIOLET RADIATION; IONS; MAGNETIC FIELDS; MIRRORS; PLASMA; PLASMA PRODUCTION
Descriptors DEC
CHARGED PARTICLES; ELECTROMAGNETIC RADIATION; GAS LASERS; LASERS; RADIATIONS; ULTRAVIOLET RADIATION

Optional Information

Notes
(c) 2008 American Institute of Physics