Published October 15, 2007 | Version v1
Journal article

Electrical and optical properties of ZnO:Mn thin films grown by MOCVD

  • 1. Material Science Department, Tbilisi State University, 3, Chavchavdze Ave.2801, Tbilisi, Georgia (United States)
  • 2. Groupe d'Etudes de la Matiere Condensee, CNRS-Universite de Versailles Saint Quentin en Yvelines, 1 Pl. Aristide Briand, 92195 Meudon Cedex (France)

Description

Diluted magnetic semiconductor epitaxial thin films of Zn1-xMnxO have been grown on c-sapphire by the MOCVD technique. Variations of a and c lattice parameters follow Vegard's law and attest to the incorporation of substitutional Mn2+ ions. Carrier concentration (n-type) and electron mobility were studied versus temperature for different concentrations of manganese. Incorporation of manganese leads to the opening of the band gap, observed as a blue shift in energy regarding pure ZnO

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2007.03.133

Additional details

Identifiers

DOI
10.1016/j.tsf.2007.03.133;
PII
S0040-6090(07)00469-5;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
24
Journal Page Range
p. 8519-8523
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
1. international symposium on transparent conducting oxides
Dates
23-26 Oct 2006
Place
Crete (Greece)

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.