Structural, electronic and magnetic properties of Co2MnSi/Ag(1 0 0) interface
Creators
- 1. School of Physical Science and Technology, Southwest University, Chongqing 400715 (China)
- 2. Department of Physics, Zunyi Normal College, Zunyi 563002 (China)
Description
Highlights: • Interfacial MnSi atoms prefer to locate in the bridge sites between two Ag atoms. • A2 disorder of Co2MnSi layers near the interface is most likely to occur. • Spin polarization is reduced by interface itself and interfacial disorder. - Abstract: The performance of advanced current-perpendicular-to-plane giant magnetoresistance (MR) built of ferromagnetic (FM) electrodes and nonmagnetic metals as a spacer depends decisively on the properties of the FM/metal interface. Here we investigate the interface character between Co2MnSi and Ag by using the first-principles density functional simulations. To simulate the actual cases, we build two types of interfaces, namely tO and bO interfaces by connecting the most favorable MnSi-termination of nine ordered Co2MnSi layers to the top of Ag and the bridge site between two Ag atoms of seven atomic layers, respectively. Our calculations indicate that the bO interface is more probable to form in the growth than the tO interface due to the lower formation energy and interface free energy, and the interface states occur in the minority-spin gap, leading to the destruction of half-metallicity of the ordered Co2MnSi. Further, taking into account the atomic disorder of the Co2MnSi layers near the interface, we show that the A2 disorder is most likely to occur in the layers close to the interface due to the lower formation energy and interface free energy, and the interface states occurring in the spin-minority gap are strengthened and the spin polarization is further degraded by the A2 disorder of Co2MnSi layers. Therefore, the spin-polarization reduction induced by interface itself and the disorder of Co2MnSi layers close to the interface, together with the interface roughness indicated by the calculations, may be main causes of very low MR ratio
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jallcom.2014.09.129Additional details
Identifiers
- DOI
- 10.1016/j.jallcom.2014.09.129;
- PII
- S0925-8388(14)02302-0;
Publishing Information
- Journal Title
- Journal of Alloys and Compounds
- Journal Volume
- 623
- Journal Page Range
- p. 29-35
- ISSN
- 0925-8388
- CODEN
- JALCEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47011902
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COBALT COMPOUNDS; DENSITY FUNCTIONAL METHOD; ELECTRODES; FORMATION HEAT; FREE ENERGY; HEUSLER ALLOYS; INTERFACES; LAYERS; MAGNETIC PROPERTIES; MAGNETISM; MAGNETORESISTANCE; MANGANESE COMPOUNDS; MANGANESE SILICIDES; METALLICITY; PERFORMANCE; ROUGHNESS; SILICON COMPOUNDS; SILVER; SIMULATION; STABILITY
- Descriptors DEC
- ALLOYS; ALUMINIUM ALLOYS; CALCULATION METHODS; COPPER ALLOYS; COPPER BASE ALLOYS; CORROSION RESISTANT ALLOYS; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; ELEMENTS; ENERGY; ENTHALPY; MANGANESE ALLOYS; MANGANESE COMPOUNDS; METALS; PHYSICAL PROPERTIES; REACTION HEAT; SILICIDES; SILICON COMPOUNDS; SURFACE PROPERTIES; THERMODYNAMIC PROPERTIES; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; VARIATIONAL METHODS
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.