Published March 3, 2008 | Version v1
Journal article

Fluorescence detection and imaging of amino-functionalized organic monolayer

  • 1. National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047 (Japan)
  • 2. National Institute of Advanced Industrial Science and Technology (AIST), 2266-98 Anagahora, Shimo-shidami, Moriyama, Nagoya 463-8560 (Japan)

Description

Amino-terminated organic monolayer formed on silicon covered with native oxide (SiO2/Si) was directly visualized under observation with fluorescent microscopy. This successful fluorescence visualization was achieved by a combination of fluorescamine method and photopatterning of the amino-terminated surface. As a typical example, an amino-terminated self-assembled monolayer (SAM) was formed on SiO2/Si substrate in a vapor of 12.5 vol.% solution of N-(6-aminohexyl)-3-aminopropyltrimethoxysilane [H2N(CH2)6NH(CH2)3Si(OCH3)3, AHAPS] diluted with absolute toluene. A micropattern of AHAPS-SAM was photolithographycally prepared using 172 nm vacuum ultraviolet (VUV) light under a reduced pressure of 10 Pa for 30 min through a photomask. The resultant micropattern composed of AHAPS- and SiOH-covered regions was provided to fluorescamine method. Due to a nonluminescence of fluorescamine itself under UV/visible irradiation, a fluorescent emission could not be observed on SiOH regions of the micropattern. In contrast, fluorescamine reacted with the outermost amino group of the AHAPS-SAM to give a fluorescent emission. A comprehensible fluorescence method for verifying formation of an amino-terminated organic monolayer has been developed

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2007.04.096

Additional details

Identifiers

DOI
10.1016/j.tsf.2007.04.096;
PII
S0040-6090(07)00706-7;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
516
Journal Issue
9
Journal Page Range
p. 2541-2546
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
7. international conference on nano-molecular electronics
Acronym
ICNME 2006
Dates
13-15 Dec 2006
Place
Kobe (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39073734
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
FAR ULTRAVIOLET RADIATION; FLUORESCENCE; IRRADIATION; MICROSCOPY; SILICON; SILICON OXIDES; TOLUENE
Descriptors DEC
ALKYLATED AROMATICS; AROMATICS; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; ELEMENTS; EMISSION; HYDROCARBONS; LUMINESCENCE; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; RADIATIONS; SEMIMETALS; SILICON COMPOUNDS; ULTRAVIOLET RADIATION

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.