Measurement of OH Radicals in Dielectric Barrier Discharge Plasmas by Cavity Ring-Down Spectroscopy
- 1. Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024 (China)
Description
Near-infrared continuous wave cavity ring-down spectroscopy was applied to measure the OH radicals in dielectric barrier discharge plasmas, which play an important role in combustion systems, atmospheric chemistry and the removal of air pollutants by non-thermal plasmas. The P-branches of OH X2Πi ν = 2 <- ν = 0) bands were used for number density measurements. The OH number density and plasma temperature were determined for different applied voltages, gas pressures and concentrations of both oxygen and water. The temporal evolution of the OH number density was obtained by using the 'time window' method, which was used to extract individual ring-down times at different times in a half period of the sine wave applied voltage in dielectric barrier discharge plasmas.
Availability note (English)
Available from http://dx.doi.org/10.1088/1009-0630/12/2/08Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Science and Technology
- Journal Volume
- 12
- Journal Issue
- 2
- Journal Page Range
- p. 166-171
- ISSN
- 1009-0630
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42022967
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- DENSITY; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; ELECTRON TEMPERATURE; HYDROXYL RADICALS; ION TEMPERATURE; PLASMA; SPECTROSCOPY
- Descriptors DEC
- MATERIALS; PHYSICAL PROPERTIES; RADICALS