Published April 2010 | Version v1
Journal article

Measurement of OH Radicals in Dielectric Barrier Discharge Plasmas by Cavity Ring-Down Spectroscopy

  • 1. Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024 (China)

Description

Near-infrared continuous wave cavity ring-down spectroscopy was applied to measure the OH radicals in dielectric barrier discharge plasmas, which play an important role in combustion systems, atmospheric chemistry and the removal of air pollutants by non-thermal plasmas. The P-branches of OH X2Πi ν = 2 <- ν = 0) bands were used for number density measurements. The OH number density and plasma temperature were determined for different applied voltages, gas pressures and concentrations of both oxygen and water. The temporal evolution of the OH number density was obtained by using the 'time window' method, which was used to extract individual ring-down times at different times in a half period of the sine wave applied voltage in dielectric barrier discharge plasmas.

Availability note (English)

Available from http://dx.doi.org/10.1088/1009-0630/12/2/08

Additional details

Identifiers

Publishing Information

Journal Title
Plasma Science and Technology
Journal Volume
12
Journal Issue
2
Journal Page Range
p. 166-171
ISSN
1009-0630

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42022967
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
DENSITY; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; ELECTRON TEMPERATURE; HYDROXYL RADICALS; ION TEMPERATURE; PLASMA; SPECTROSCOPY
Descriptors DEC
MATERIALS; PHYSICAL PROPERTIES; RADICALS