Hydrophobic coatings on selected polymers in an atmospheric pressure dielectric barrier discharge
Creators
- 1. Surface Science Laboratory, University of Ulster, Coleraine, BT52 1SA (United Kingdom)
Description
We present results on the development of hydrophobic coatings on polymers in an atmospheric pressure dielectric barrier discharge (DBD). The effects of X + N2 DBD are studied, where X refers to chlorine- and/or fluorine- containing precursors, aiming at surface modification with chemically bound halogen-bearing entities. The discharge parameters and the treatment conditions were optimized, both in terms of diminution of the oxygen level in the reactor and efficient creation of X + N2 environments. Surface analysis and characterization were performed using x-ray photoelectron spectroscopy, contact angle measurement and scanning electron microscopy. The deposition of stable hydrophobic coatings, with a complex structure due to polymerization and cross-linking, with contributions from both halogen species, fluorine and chlorine, is demonstrated
Additional details
Identifiers
- DOI
- 10.1088/0022-3727/40/7/015;
- PII
- S0022-3727(07)40586-1;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 40
- Journal Issue
- 7
- Journal Page Range
- p. 1927-1936
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38085867
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ATMOSPHERIC PRESSURE; CHLORINE; COATINGS; CROSS-LINKING; DEPOSITION; DIELECTRIC MATERIALS; FLUORINE; OXYGEN; POLYMERS; PRECURSOR; SCANNING ELECTRON MICROSCOPY; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHEMICAL REACTIONS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; HALOGENS; MATERIALS; MICROSCOPY; NONMETALS; PHOTOELECTRON SPECTROSCOPY; POLYMERIZATION; SPECTROSCOPY