Microstructure and property of diamond-like carbon films with Al and Cr co-doping deposited using a hybrid beams system
- 1. School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006 (China)
- 2. Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China)
- 3. Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou 730000 (China)
Description
Highlights: • Diamond-like carbon films with Al and Cr doping were deposited. • Alternate multilayered structure consisted of Al-poor layer and Al-rich layer was formed. • The periodic Al-rich layers can greatly improve the residual stress and elastic resilience of the films. - Abstract: DLC films with weak carbide former Al and carbide former Cr co-doping (Al:Cr-DLC) were deposited by a hybrid beams system comprising an anode-layer linear ion beam source (LIS) and high power impulse magnetron sputtering using a gas mixture of C2H2 and Ar as the precursor. The doped Al and Cr contents were controlled via adjusting the C2H2 fraction in the gas mixture. The composition, microstructure, compressive stress, mechanical properties and tribological behaviors of the Al:Cr-DLC films were researched carefully using X-ray photoelectron spectroscopy, transmission electron microscopy, Raman spectroscopy, stress-tester, nanoindentation and ball-on-plate tribometer as function of the C2H2 fraction. The results show that the Al and Cr contents in the films increased continuously as the C2H2 fraction decreased. The doped Cr atoms preferred to bond with the carbon while the Al atoms mainly existed in metallic state. Structure modulation with alternate multilayer consisted of Al-poor DLC layer and Al-rich DLC layer was found in the films. Those periodic Al-rich DLC layers can effectively release the residual stress of the films. On the other hand, the formation of the carbide component due to Cr incorporation can help to increase the film hardness. Accordingly, the residual stress of the DLC films can be reduced without sacrificing the film hardness though co-doping Al and Cr atoms. Furthermore, it was found that the periodic Al-rich layer can greatly improve the elastic resilience of the DLC films and thus decreases the film friction coefficient and wear rate significantly. However, the existence of the carbide component would cause abrasive wear and thus deteriorate the wear performance of the films.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2015.11.025Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2015.11.025;
- PII
- S0169-4332(15)02704-X;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 388
- Journal Issue
- Part A
- Journal Page Range
- p. 503-509
- ISSN
- 0169-4332
- CODEN
- ASUSEE
Conference
- Title
- 1. international conference on applied surface science
- Dates
- 27-30 Jul 2016
- Place
- Shanghai (China)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48077329
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM ADDITIONS; CARBIDES; CHROMIUM ADDITIONS; DIAMONDS; DOPED MATERIALS; FILMS; FRICTION FACTOR; HARDNESS; ION BEAMS; LAYERS; MICROSTRUCTURE; PERFORMANCE; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- ALLOYS; ALUMINIUM ALLOYS; BEAMS; CARBON; CARBON COMPOUNDS; CHROMIUM ALLOYS; DIMENSIONLESS NUMBERS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; LASER SPECTROSCOPY; MATERIALS; MECHANICAL PROPERTIES; MICROSCOPY; MINERALS; NONMETALS; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY; STRESSES; TRANSITION ELEMENT ALLOYS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.