High-frequency properties of discontinuous FeCoSi/native-oxide multilayer films
- 1. Key Laboratory for Magnetism and Magnetic Materials of Ministry of Education, Lanzhou University, Lanzhou 730000 (China)
Description
Discontinuous [FeCoSi (d)/native-oxide]50 multilayer films were fabricated by DC magnetron sputtering without any post-deposition treatment. The films exhibit good soft magnetic properties with initial permeability μi larger than 100, the saturation magnetization 4πMs and the in-plane uniaxial anisotropy field Hk increase as the magnetic FeCoSi layer thickness d is increased from 5.5 to 20.5 A. As a consequence, the ferromagnetic resonance frequencies fr of the films increase from 2.0 to 3.9 GHz. The combination of high fr and large μi makes these films potential candidates for magnetic devices applied in the high-frequency range. The origin of the excellent high-frequency properties in discontinuous FeCoSi/native-oxide multilayer films is discussed.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jmmm.2009.06.052Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2009.06.052;
- PII
- S0304-8853(09)00672-6;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 321
- Journal Issue
- 20
- Journal Page Range
- p. 3453-3456
- ISSN
- 0304-8853
- CODEN
- JMMMDC
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41010052
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANISOTROPY; COBALT; FERROMAGNETIC RESONANCE; FILMS; GHZ RANGE 01-100; IRON; LAYERS; MAGNETIC PROPERTIES; MAGNETIZATION; MAGNETRONS; OXIDES; PERMEABILITY; SILICON; SPUTTERING
- Descriptors DEC
- CHALCOGENIDES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FREQUENCY RANGE; GHZ RANGE; MAGNETIC RESONANCE; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RESONANCE; SEMIMETALS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.