Published November 2005
| Version v1
Journal article
Scaling properties of YBa2Cu3Ox films
- 1. Institute of Applied Physics, Academy of Sciences of the Moldova Republic, Academie street 5, Chisinau, MD 2028 (Moldova, Republic of)
- 2. GPMD-Universite Paris 12, 61 avenue De Gaulle, 94010 CRETEIL Cedex (France)
Description
An alternative simple method is proposed for analysing the scaling properties of the high-Tc superconductor cuprates. The temperature is rescaled with a parameter TR determined from the precise analysis of RH(1/T), where RH is the Hall coefficient, in the high-temperature range. To illustrate this new method, the resistivity and Hall effect data obtained on underdoped YBa2Cu3Ox epitaxial thin films are analysed. It is shown that the temperature-dependent resistivity ρ(T), Hall coefficient RH(T) and the cotangent of the Hall angle cot θH(T) of underdoped YBa2Cu3Ox can be scaled into universal curves using this parameter TR to make a linear transformation of temperature and ρ(T), RH(T) or cotθH(T)
Availability note (English)
Available online at http://stacks.iop.org/0953-2048/18/1437/sust5_11_004.pdf or at the Web site for the journal Superconductor Science and Technology (ISSN 1361-6668) http://www.iop.org/Additional details
Identifiers
- URL
- http://stacks.iop.org/0953-2048/18/1437/sust5_11_004.pdf; http://www.iop.org/;
- DOI
- 10.1088/0953-2048/18/11/004;
- PII
- S0953-2048(05)98710-1;
Publishing Information
- Journal Title
- Superconductor Science and Technology
- Journal Volume
- 18
- Journal Issue
- 11
- Journal Page Range
- p. 1437-1440
- ISSN
- 0953-2048
- CODEN
- SUSTEF
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36095580
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- BARIUM COMPOUNDS; CUPRATES; EPITAXY; HALL EFFECT; SUPERCONDUCTORS; TEMPERATURE DEPENDENCE; THIN FILMS; YTTRIUM COMPOUNDS
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; COPPER COMPOUNDS; CRYSTAL GROWTH METHODS; FILMS; OXYGEN COMPOUNDS; TRANSITION ELEMENT COMPOUNDS