Surface chemistry of dry etching processes

Much of the fundamental information that has been obtained regarding dry etching processes has come via simulations of the etching environment using beams of ions and reactive neutral species in high or ultrahigh vacuum where the tools of surface science can be applied. This review concentrates mostly on results obtained from these various simulations of the dry process environment. The effects of energetic ion impact on surfaces, both in the absence and presence of reactive adsorbates, and the synergistic effects that result from the simultaneous exposure of the surface to reactive neutrals and energetic ions are examined. 170 refs.; 23 figs.; 1 table