Microstructure and electrochemical corrosion behavior of Cr–Ni–Fe alloy deposits electroplated in the presence of trivalent Cr ions
- 1. Department of Mechanical Engineering, Chang Gung University, Taoyuan, Taiwan (China)
- 2. Central Facility for Electron Microscopy (GFE), RWTH Aachen University, Aachen (Germany)
Description
Cr–Ni–Fe alloy deposits containing different Cr, Ni and Fe contents were created by varying the electroplating current density in an eco-friendly trivalent Cr-based bath with Ni2+ and Fe2+ ions. The Cr content of the Cr–Ni–Fe alloy deposits increased from 14 to 75 wt.% when the electroplating current density changed from 15 to 25 A/dm2. The mapping result obtained with a scanning electron microscope showed that a uniform ternary Cr–Ni–Fe alloy deposit could be obtained from the proposed bath, and X-ray diffraction results indicated the Fe-based alloy electroplated at 15 A/dm2 was crystalline, whereas the Cr-based alloy deposits electroplated at a high current density had an amorphous structure. The electrochemical corrosion test results showed that the corrosion resistance of the Cr–Ni–Fe alloy deposit electroplated at 20 A/dm2 was better than that of the Cr–Ni–Fe alloy deposit obtained at 25 A/dm2, despite having almost identical chemical compositions. These results were obtained by performing an electrochemical test and microstructure observations. - Highlights: • Cr–Ni–Fe alloy deposits were obtained in an eco-friendly Cr (III) bath. • Cr–Ni–Fe alloy deposits with different Cr, Ni and Fe contents were achieved. • Fe-rich and Cr-rich deposits were obtained by varying the plating current density. • Fe-rich deposits are crystalline, but Cr-rich deposits are amorphous. • An electrochemical corrosion test was conducted with Fe- and Cr-rich deposits
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2013.04.124Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2013.04.124;
- PII
- S0040-6090(13)00760-8;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 544
- Journal Page Range
- p. 69-73
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 6. international conference on technological advances of thin films and surface coatings
- Dates
- 14-17 Jul 2012
- Place
- Singapore (Singapore)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46090290
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALLOYS; CHROMIUM IONS; CORROSION RESISTANCE; CURRENT DENSITY; DEPOSITS; ELECTROCHEMICAL CORROSION; ELECTROPLATING; IRON IONS; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- CHARGED PARTICLES; CHEMICAL REACTIONS; COHERENT SCATTERING; CORROSION; DEPOSITION; DIFFRACTION; ELECTRODEPOSITION; ELECTROLYSIS; ELECTRON MICROSCOPY; IONS; LYSIS; MICROSCOPY; PLATING; SCATTERING; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.