Published July 15, 1982
| Version v1
Journal article
Optical absorption of silicon between 1.6 and 4.7 eV at elevated temperatures
Creators
- 1. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
Description
The optical absorption coefficient of silicon for photon energies between 1.65 and 4.77 eV (750-- 260 nm) has been determined at elevated temperatures (up to 700 0C) using polarization modulation ellipsometry. For photon energies below approx.3 eV (approx.410 nm), the absorption coefficient increases exponentially with temperature from room 240 C to 700 0C, increasing by a factor of approximately 5 over that temperature range. The threshold for direct band-gap absorption moves to lower energies with increasing temperature
Additional details
Publishing Information
- Journal Title
- Appl. Phys. Lett.
- Journal Volume
- 41
- Journal Issue
- 2
- Series
- Appl. Phys. Lett.
- Journal Page Range
- 180-182
- ISSN
- 0003-6951
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 14723561
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATTENUATION; ENERGY GAP; HIGH TEMPERATURE; MATHEMATICAL MODELS; MEASURING METHODS; MEDIUM TEMPERATURE; MODULATION; OPTICAL PROPERTIES; POLARIZATION; SILICON; TEMPERATURE DEPENDENCE; ULTRAVIOLET RADIATION; VISIBLE RADIATION
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; PHYSICAL PROPERTIES; RADIATIONS; SEMIMETALS