Published May 14, 2013 | Version v1
Journal article

Evidence of the semiconductor-metal transition in V2O5 thin films by the pulsed laser photoacoustic method

  • 1. Instituto de Física-Universidad Nacional Autónoma de México, Mexico DF (Mexico)
  • 2. Laboratorio de Fotofísica y Películas Delgadas, CCADET-UNAM, Mexico DF (Mexico)

Description

In this work, the pulsed photoacoustic technique was used to investigate the semiconductor-metal transition of thin vanadium pentoxide films (V2O5) under increasing temperature. The V2O5 thin films were simultaneously deposited by RF magnetron sputtering at room temperature, on corning glass and SnO2:F/glass substrates, in order to compare the photoacoustic response. The elemental and structural analysis of the V2O5 films was performed by Rutherford backscattering spectroscopy and X-ray diffraction. The optical transmission and band gap were determined using UV-Vis spectroscopy. The electrical properties were measured using four-point probe measurements with the Van der Pauw geometry.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
113
Journal Issue
18
Journal Page Range
p. 184307-184307.6
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

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