Bilayer-induced asymmetric quantum Hall effect in epitaxial graphene
Creators
- 1. NEST, Istituto Nanoscienze–CNR and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa (Italy)
- 2. NTT Basic Research Laboratories, NTT Corporation, 3–1 Morinosato Wakamiya, Atsugi, Kanagawa, 243–0198 (Japan)
- 3. Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127 Pisa (Italy)
Description
The transport properties of epitaxial graphene on SiC(0001) at quantizing magnetic fields are investigated. Devices patterned perpendicularly to SiC terraces clearly exhibit bilayer inclusions distributed along the substrate step edges. We show that the transport properties in the quantum Hall regime are heavily affected by the presence of bilayer inclusions, and observe a significant departure from the conventional quantum Hall characteristics. In particular, we observe anomalous values of the quantized resistance and a peculiar asymmetry with magnetic field which was not observed before for graphene on SiC. A quantitative model involving enhanced inter-channel scattering mediated by the presence of bilayer inclusions is presented that successfully explains the observed symmetry properties. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0268-1242/30/5/055007Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductor Science and Technology
- Journal Volume
- 30
- Journal Issue
- 5
- Journal Page Range
- [6 p.]
- ISSN
- 0268-1242
- CODEN
- SSTEET
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47077154
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ASYMMETRY; EPITAXY; GRAPHENE; HALL EFFECT; INCLUSIONS; LAYERS; MAGNETIC FIELDS; SCATTERING; SILICON CARBIDES; SUBSTRATES; SYMMETRY; TRANSPORT THEORY
- Descriptors DEC
- CARBIDES; CARBON; CARBON COMPOUNDS; CRYSTAL GROWTH METHODS; ELEMENTS; NONMETALS; SILICON COMPOUNDS