Published May 2015 | Version v1
Journal article

Bilayer-induced asymmetric quantum Hall effect in epitaxial graphene

  • 1. NEST, Istituto Nanoscienze–CNR and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa (Italy)
  • 2. NTT Basic Research Laboratories, NTT Corporation, 3–1 Morinosato Wakamiya, Atsugi, Kanagawa, 243–0198 (Japan)
  • 3. Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127 Pisa (Italy)

Description

The transport properties of epitaxial graphene on SiC(0001) at quantizing magnetic fields are investigated. Devices patterned perpendicularly to SiC terraces clearly exhibit bilayer inclusions distributed along the substrate step edges. We show that the transport properties in the quantum Hall regime are heavily affected by the presence of bilayer inclusions, and observe a significant departure from the conventional quantum Hall characteristics. In particular, we observe anomalous values of the quantized resistance and a peculiar asymmetry with magnetic field which was not observed before for graphene on SiC. A quantitative model involving enhanced inter-channel scattering mediated by the presence of bilayer inclusions is presented that successfully explains the observed symmetry properties. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/30/5/055007

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
30
Journal Issue
5
Journal Page Range
[6 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47077154
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ASYMMETRY; EPITAXY; GRAPHENE; HALL EFFECT; INCLUSIONS; LAYERS; MAGNETIC FIELDS; SCATTERING; SILICON CARBIDES; SUBSTRATES; SYMMETRY; TRANSPORT THEORY
Descriptors DEC
CARBIDES; CARBON; CARBON COMPOUNDS; CRYSTAL GROWTH METHODS; ELEMENTS; NONMETALS; SILICON COMPOUNDS