Published May 26, 2006 | Version v1
Journal article

Oxygen atom density in rare gas diluted O2 radio frequency plasma

  • 1. Department of Electric and Electronic Engineering, National Defense Academy, Yokosuka 239-8686 (Japan)
  • 2. Department of Electronics and Electrical Engineering, Keio University, Yokohama 223-8522 (Japan)

Description

The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms

Additional details

Identifiers

DOI
10.1016/j.tsf.2005.08.091;
PII
S0040-6090(05)01328-3;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
506-507
Journal Page Range
p. 489-493
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
Joint meeting of 7. APCPST (Asia Pacific conference on plasma science and technology) and 17. SPSM (symposium on plasma science for materials)
Dates
29 Jun - 2 Jul 2004
Place
Fukuoka (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38004641
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION SPECTROSCOPY; ARGON; ATOMS; DEPOSITION; DIFFUSION; DILUTION; GLOW DISCHARGES; HELIUM; IONIZATION; KRYPTON; OXYGEN; PLASMA; PULSES; RADIOWAVE RADIATION; ULTRAVIOLET RADIATION
Descriptors DEC
ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; NONMETALS; RADIATIONS; RARE GASES; SPECTROSCOPY

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.