Published May 26, 2006
| Version v1
Journal article
Oxygen atom density in rare gas diluted O2 radio frequency plasma
- 1. Department of Electric and Electronic Engineering, National Defense Academy, Yokosuka 239-8686 (Japan)
- 2. Department of Electronics and Electrical Engineering, Keio University, Yokohama 223-8522 (Japan)
Description
The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2005.08.091;
- PII
- S0040-6090(05)01328-3;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 506-507
- Journal Page Range
- p. 489-493
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- Joint meeting of 7. APCPST (Asia Pacific conference on plasma science and technology) and 17. SPSM (symposium on plasma science for materials)
- Dates
- 29 Jun - 2 Jul 2004
- Place
- Fukuoka (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38004641
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; ARGON; ATOMS; DEPOSITION; DIFFUSION; DILUTION; GLOW DISCHARGES; HELIUM; IONIZATION; KRYPTON; OXYGEN; PLASMA; PULSES; RADIOWAVE RADIATION; ULTRAVIOLET RADIATION
- Descriptors DEC
- ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; NONMETALS; RADIATIONS; RARE GASES; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.