Published October 3, 2000
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The effects of radiation damage and impurities on void dynamics in silicon
Description
no abstract available
Availability note (English)
Available from INIS in electronic form; Also available from OSTI as DE00766481; PURL: https://www.osti.gov/servlets/purl/766481-9BHeIo/webviewable/
Files
Additional details
Identifiers
Publishing Information
- Imprint Pagination
- 24 p.
- Report number
- ANL/MSD/CP--103002
Conference
- Title
- 12. International Conference on Ion Beam Modification of Materials
- Dates
- 3-8 Sep 2000
- Place
- Canela - Rio Grande do Sul (Brazil)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 32025792
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- HELIUM IONS; IMPURITIES; ION BEAMS; ION IMPLANTATION; PHYSICAL RADIATION EFFECTS; SILICON
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; ELEMENTS; IONS; RADIATION EFFECTS; SEMIMETALS
Optional Information
- Contract/Grant/Project number
- W-31109-ENG-38
- Funding organization
- US Department of Energy (United States)