Published May 7, 2007 | Version v1
Journal article

Initial study on the structure and optical properties of Zn1-xFe xO films

  • 1. Key Laboratory of Thin Films of Jiangsu, Suzhou university, Suzhou 215006 (China)
  • 2. Department of Physics, Suzhou University, Suzhou 215006 (China)
  • 3. Key Laboratory of Thin Films of Jiangsu, Suzhou university, Suzhou 215006 (China) and Analysis and Testing Center, Suzhou University, Suzhou 215006 (China)
  • 4. Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 (China)

Description

Zn1-xFe xO (x = 0, 0.052, 0.103, 0.157 and 0.212) films were prepared by the radio-frequency magnetron sputtering technique on Si (111) substrates and the microstructure of which was characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy. The samples had a preferential c-axis orientation and the position of (002) diffraction peak shifted to the lower degree side with increasing Fe component. In order to investigate the optical transmittance properties of Zn1-xFe xO films, we prepared the films on Al2O3 (001) substrates simultaneity and the UV-VIS optical transmittance spectra showed that the band gap energy of Zn1-xFe xO films decreased with increase of Fe concentration. Photoluminescence spectra of the samples were observed at room temperature

Additional details

Identifiers

DOI
10.1016/j.tsf.2007.01.015;
PII
S0040-6090(07)00034-X;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
515
Journal Issue
13
Journal Page Range
p. 5462-5465
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.