Published November 1, 2011 | Version v1
Journal article

Analytical model for the dispersion of sub-threshold current in organic thin-film transistors

  • 1. Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)

Description

This paper proposes an equivalent circuit model to analyze the reason for the dispersion of sub-threshold current (also known as zero-current point dispersion) in organic thin-film transistors. Based on the level 61 amorphous silicon thin-film transistor model in star-HSPICE, the results from our equivalent circuit model simulation reveal that zero-current point dispersion can be attributed to two factors: large contact resistance and small gate resistance. Furthermore, it is found that decreasing the contact resistance and increasing the gate resistance can efficiently reduce the dispersion. If the contact resistance can be controlled to 0 Ω, all the zero-current points can gather together at the base point. A large gate resistance is good for constraining the dispersion of the zero-current points and gate leakage. The variances of the zero-current points are 0.0057 and nearly 0 when the gate resistances are 17 MΩ and 276 MΩ, respectively. (semiconductor devices)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/32/11/114004

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
32
Journal Issue
11
Journal Page Range
[5 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43103715
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DISPERSIONS; EQUIVALENT CIRCUITS; SEMICONDUCTOR MATERIALS; SILICON; SIMULATION; THIN FILMS; THRESHOLD CURRENT; TRANSISTORS
Descriptors DEC
CURRENTS; ELECTRIC CURRENTS; ELECTRONIC CIRCUITS; ELEMENTS; FILMS; MATERIALS; SEMICONDUCTOR DEVICES; SEMIMETALS