Published August 2008
| Version v1
Journal article
Etching characteristic for tracks of multicharged ions in polymer
- 1. Institute of Heavy Ion Physics, State Key Laboratory of Nuclear Physics and Technology, Peking University, Beijing 100871 (China)
Description
Multicharged ions (Agq+, Cuq+, Siq+, q=1,2,3) at constant speed ∼vBohr (Bohr velocity) were used to irradiate PC (polycarbonate) foils which were subsequently chemically etched. Because of the low ion dose of <108ions/cm2, pores on the surface were discrete. The diameters of the pores were measured by means of scanning electron microscopy (SEM). From the linear dependence of the pore diameter on the etching time, the transversal etching rate can be obtained. It was found that the transversal etching rate decreased with ion charge. These results can mainly be explained by the variation of the charge exchange process for ions with a different charge state
Availability note (English)
Available from http://dx.doi.org/10.1016/j.radmeas.2008.04.073Additional details
Identifiers
- DOI
- 10.1016/j.radmeas.2008.04.073;
- PII
- S1350-4487(08)00211-4;
Publishing Information
- Journal Title
- Radiation Measurements
- Journal Volume
- 43
- Journal Issue
- suppl.1
- Journal Page Range
- p. S111-S115
- ISSN
- 1350-4487
- CODEN
- RMEAEP
Conference
- Title
- 23. international conference on nuclear tracks in solids
- Dates
- 11-15 Sep 2006
- Place
- Beijing (China)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40008256
- Subject category
- S61: RADIATION PROTECTION AND DOSIMETRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHARGE EXCHANGE; CHARGE STATES; ENERGY LOSSES; ETCHING; MULTICHARGED IONS; PARTICLE TRACKS; POLYCARBONATES; RADIATION DOSES; SCANNING ELECTRON MICROSCOPY
- Descriptors DEC
- CARBON COMPOUNDS; CARBONATES; CHARGED PARTICLES; DOSES; ELECTRON MICROSCOPY; IONS; LOSSES; MICROSCOPY; ORGANIC COMPOUNDS; ORGANIC POLYMERS; OXYGEN COMPOUNDS; POLYMERS; SURFACE FINISHING
Optional Information
- Copyright
- Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.