Published December 2018 | Version v1
Journal article

The effect of Si impurities on the transport properties and the electron-surface phonon interaction in single layer graphene deposited on polar substrates

  • 1. Laboratoire de Physique des Matériaux: Structure et Propriétés, Groupe Physique des Composants et Dispositifs Nanométriques, Faculté des Sciences de Bizerte, University of Carthage, 7021, Jarzouna, Bizerte (Tunisia)
  • 2. Solid State Physics Section, Physics Department, National and Kapodistrian University of Athens, Panepistimioupolis, 15784, Zografos, Athens (Greece)

Description

Highlights: • Effect of Si impurities on transport properties in one layer graphene on polar substrates (SiO2, HfO2, SiC , hexagonal BN). • Study of the effect of the Si impurities on electron-surface phonon interaction in one layer graphene on polar substrates. • Investigation of the effect of Si impurities on optical properties in one layer graphene on polar substrates. - Abstract: We investigated theoretically the effect of introducing Si impurities in a single layer graphene (1LG) that had been deposited on a polar substrate on the transport properties of the graphene layer. We consider in our analysis the scattering effects due to the surface optical (SO) phonons located at the interface of the 1LG with various polar substrates such asSiC, hexagonal BN,SiO2andHfO2. Our results demonstrate a reduction of SO phonon-limited (SOPL) mobility, and SOPL conductivity as well as an increase of the SOPL resistivity and of the scattering rate in the presence of Si impurities in the 1LG. Further, we studied the effect of Si impurities on the electron-surface phonon interaction. For our analysis we used the eigenenergies aquired from the tight-binding Hamiltonian in 1LG. Indeed the presence of the Si impurities induces a decrement in the resonant coupling between the electronic sub-levels and the surface vibration modes in monolayer graphene deposited on polar substrates. Finally, we investigated the effect of Si impurities on the Auger scattering process which affects the carriers relaxation. Our results show an enhancement of the Auger scattering rate in the case of the Si-doped 1LG compared to the undoped 1LG.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physb.2018.08.050

Additional details

Identifiers

DOI
10.1016/j.physb.2018.08.050;
PII
S0921452618305416;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
550
Journal Page Range
p. 171-178
ISSN
0921-4526
CODEN
PHYBE3

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.