Published November 2019 | Version v1
Journal article

The damage mechanism and process of metal multi-layer dielectric gratings induced by ps-pulsed laser

  • 1. State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan, Hubei, 430070, PR (China)

Description

In the present paper, we have prepared a multi-layer grating on a layer of gold film. The gratings laser damage threshold and damage morphologies have been tested using an 800 nm wavelength, 450 ps laser pulse. The gratings laser damage threshold is 0.95 J/cm2. Based on the tested damage characteristics and the calculated temperature field and stress field in gratings, the gratings damage mechanism has been analyzed. In theoretical calculation, the ionization process of dielectric layers in gratings and the distribution as well as evolution of the dielectric absorption coefficient have been considered. It can be concluded that the gratings damage process is thermal ablation action dominated.

Additional details

Identifiers

DOI
10.1016/j.apsusc.2019.07.084;
PII
S0169433219321208;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
494
Journal Page Range
p. 977-982
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
55041991
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ABSORPTION; DIELECTRIC MATERIALS; GOLD; IONIZATION; LASERS; LAYERS; MORPHOLOGY; PULSES; THIN FILMS
Descriptors DEC
ELEMENTS; FILMS; MATERIALS; METALS; SORPTION; TRANSITION ELEMENTS

Optional Information

Copyright
Copyright (c) 2019 Elsevier B.V. All rights reserved.