Radiation damage in fcc metals

Using the RBS-channeling technique, ion damage extending to a large depth has been observed. This deep damage is the main subject of this thesis. It offers a short introduction to ion implantation in metals. The use of the RBS-channeling technique to study radiation damage is described as well as the experimental details of this technique. A proof of the existence of deep damage in the three fcc metals Cu, Al and Ag is given. The nature of this damage is also considered. The influence of impurities and other trapping centres is studied. A microscopic model based on rate equations is presented and can reproduce the experimental results reported. (Auth.)