Published February 2000
| Version v1
Journal article
Characteristics of ultraviolet-assisted pulsed-laser-deposited Y2O3 thin films
- 1. Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)
- 2. Laser Department, National Institute for Laser, Plasma, and Radiation Physics, Bucharest, (Romania)
Description
The properties of thin Y2O3 films grown using an in situ ultraviolet (UV)-assisted pulsed laser deposition (PLD) technique were studied. With respect to Y2O3 films grown by conventional PLD under similar conditions but without UV illumination, the UVPLD-grown films exhibited better structural and optical properties, especially for lower substrate temperatures, from 340 to 400 degree sign C. These layers were highly crystalline and textured along the (111) direction, and their refractive index values were similar to those of reference Y2O3 layers. They also exhibited a better stoichiometry and contained less physisorbed oxygen than the conventional PLD-grown layers. (c) 2000 Materials Research Society
Additional details
Publishing Information
- Journal Title
- Journal of Materials Research
- Journal Volume
- 15
- Journal Issue
- 2
- Journal Page Range
- p. 488-494
- ISSN
- 0884-2914
- CODEN
- JMREEE
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 32059718
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- DEPOSITION; EXPERIMENTAL DATA; MICROSTRUCTURE; REFRACTIVE INDEX; SORPTIVE PROPERTIES; STOICHIOMETRY; TEXTURE; THIN FILMS; VISIBLE SPECTRA; YTTRIUM OXIDES
- Descriptors DEC
- CHALCOGENIDES; DATA; FILMS; INFORMATION; NUMERICAL DATA; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SPECTRA; SURFACE PROPERTIES; TRANSITION ELEMENT COMPOUNDS; YTTRIUM COMPOUNDS
- Proposed descriptors and Free-text terms
- pulsed laser deposition; crystal microstructure