Published October 3, 2005 | Version v1
Journal article

Patterning of nanostructured thin films by structured light illumination

  • 1. Laboratoire Materiaux et Phenomenes Quantiques, CNRS UMR 7162, Universite Paris 7 Denis Diderot and Laboratoire de Physique du Solide, ESPCI, 10 rue Vauquelin, 75005 Paris Cedex (France)

Description

Light-induced reshaping of silver nanostructured films near the percolation threshold are investigated using a KrF excimer laser emitting at 248 nm. Depending on the laser intensity and the number of pulses, striking effects are observed for which the irregular particles melt and transform into spherical shaped particles. We show that the laser-induced modifications can be spatially designed by irradiating through masks and gratings taking advantage of their respective diffractive properties. This permits an easy and well controlled way to produce a variety of submicron patterning. The induced patterns accurately coincide with the intensity variations of the illumination field

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
87
Journal Issue
14
Journal Page Range
p. 143103-143103.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37024180
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
Descriptors DEI
DIFFRACTION GRATINGS; KRYPTON FLUORIDE LASERS; NANOSTRUCTURES; PULSES; SILVER; THIN FILMS; VISIBLE RADIATION
Descriptors DEC
ELECTROMAGNETIC RADIATION; ELEMENTS; EXCIMER LASERS; FILMS; GAS LASERS; LASERS; METALS; RADIATIONS; TRANSITION ELEMENTS

Optional Information

Notes
(c) 2005 American Institute of Physics