Published September 2013
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Defect formation in quinonediazide-phenolformaldehyde photoresist at ions implantation
Creators
- 1. Polatski state univ., Novapolatsk (Belarus)
- 2. Belarusian state univ., Minsk (Belarus)
Description
The processes of defect formation during implantation of AF9120 positive photoresist films was investigated. It was established that defect formation radiation processes during ion implantation photoresist occur not only in the field of ion stopping, but far beyond the ions projected range. Radiation hardening effect was observed throughout the polymer film thickness, wherein beyond the projected ranges of ions this effect is more pronounced. Presumably, it is due to the processes of radiation cross-linking. (authors)
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Additional details
Additional titles
- Original title (Russian)
- Дефектообразование в диазохинон-новолачном фоторезисте при ионной имплантации
Publishing Information
- Imprint Place
- Minsk (Belarus)
- ISBN
- 978-985-553-141-9
- Imprint Title
- Interaction of radiation with solids. Proceedings of the 10th international conference
- Imprint Pagination
- 384 p.
- Journal Page Range
- p. 89-91
- Report number
- INIS-BY--099
Conference
- Title
- 10. International conference 'Interaction of radiation with solids'
- Original Conference Title
- 10. Mezhdunarodnaya konferentsiya 'Vzaimodejstvie izluchenij s tverdym telom'
- Dates
- 24-27 Sep 2013
- Place
- Minsk (Belarus)
INIS
- Country of Publication
- Belarus
- Country of Input or Organization
- Belarus
- INIS RN
- 46131550
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DEFECTS; FORMALDEHYDE; ION IMPLANTATION; ORGANIC COMPOUNDS; PHENOLS; PHYSICAL RADIATION EFFECTS; QUINONES
- Descriptors DEC
- ALDEHYDES; AROMATICS; HYDROXY COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC OXYGEN COMPOUNDS; RADIATION EFFECTS
Optional Information
- Notes
- 7 refs., 1 fig. Imprint:Vzaimodejstvie izluchenij s tverdym telom. Materialy 10 Mezhdunarodnoj konferentsii