Published December 1986 | Version v1
Report Open

Laser microfabrication technology and its application to high speed interconnect of gate arrays

Description

A goal of the LLNL Laser Pantography (LP) program has been demonstrating processes in which a computer-steered and computer-modulated laser beam directly deposits or removes material onto or from a substrate such as a silicon wafer. Substantial advantages could accrue from a fully developed set of such processes, including: lower cost for prototyping and low volume manufacturing, faster fabrication, on-line repair, and customized computers. 7 refs., 10 figs

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01; 1 as DE87004363.

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Additional details

Publishing Information

Imprint Pagination
18 p.
Report number
UCRL--95040

Conference

Title
Materials Research Society fall meeting.
Dates
1-5 Dec 1986.
Place
Boston, MA (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
18061310
Subject category
S42: ENGINEERING;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BORANES; COMPUTER-AIDED MANUFACTURING; FABRICATION; GAS LASERS; INTEGRATED CIRCUITS; NICKEL; PHOSPHINES; SILANES
Descriptors DEC
AMPLIFIERS; BORON COMPOUNDS; ELECTRONIC CIRCUITS; ELEMENTS; EQUIPMENT; HYDRIDES; HYDROGEN COMPOUNDS; LASERS; METALS; PHOSPHORUS COMPOUNDS; SILICON COMPOUNDS; TRANSITION ELEMENTS

Optional Information

Notes
Portions of this document are illegible in microfiche products.
Secondary number(s)
CONF-861207--32.