Published December 1986
| Version v1
Report
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Laser microfabrication technology and its application to high speed interconnect of gate arrays
Description
A goal of the LLNL Laser Pantography (LP) program has been demonstrating processes in which a computer-steered and computer-modulated laser beam directly deposits or removes material onto or from a substrate such as a silicon wafer. Substantial advantages could accrue from a fully developed set of such processes, including: lower cost for prototyping and low volume manufacturing, faster fabrication, on-line repair, and customized computers. 7 refs., 10 figs
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01; 1 as DE87004363.Files
18061310.pdf
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Additional details
Publishing Information
- Imprint Pagination
- 18 p.
- Report number
- UCRL--95040
Conference
- Title
- Materials Research Society fall meeting.
- Dates
- 1-5 Dec 1986.
- Place
- Boston, MA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 18061310
- Subject category
- S42: ENGINEERING;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BORANES; COMPUTER-AIDED MANUFACTURING; FABRICATION; GAS LASERS; INTEGRATED CIRCUITS; NICKEL; PHOSPHINES; SILANES
- Descriptors DEC
- AMPLIFIERS; BORON COMPOUNDS; ELECTRONIC CIRCUITS; ELEMENTS; EQUIPMENT; HYDRIDES; HYDROGEN COMPOUNDS; LASERS; METALS; PHOSPHORUS COMPOUNDS; SILICON COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Notes
- Portions of this document are illegible in microfiche products.
- Secondary number(s)
- CONF-861207--32.