Published July 1991
| Version v1
Journal article
Deposition of transparent ZrO2 on polyetherimide using a KrF excimer laser
Creators
- 1. General Electric Company, Corporate Research and Development Center, Post Office Box 8, Schenectady, New York 12301 (USA)
Description
The laser ablative deposition technique was used to deposit thin films of ZrO2 on polyetherimide. The microstructure of the film was studied by x-ray diffraction, XPS, and SEM
Additional details
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology, A
- Journal Volume
- 9
- Journal Issue
- 4
- Series
- J. Vac. Sci. Technol., A.
- Journal Page Range
- 2397-2399
- ISSN
- 0734-2101
- CODEN
- JVTAD
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22075962
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABLATION; ADHESION; DEPOSITION; EXCIMER LASERS; HIGH TEMPERATURE; LASER RADIATION; OPACITY; THIN FILMS; ZIRCONIUM OXIDES
- Descriptors DEC
- AMPLIFIERS; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; EQUIPMENT; FILMS; GAS LASERS; LASERS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; TRANSITION ELEMENT COMPOUNDS; ZIRCONIUM COMPOUNDS