Published January 11, 1988 | Version v1
Journal article

In situ resistance of Y1Ba2Cu3O/sub x/ films during anneal

  • 1. IBM Research Division, T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598

Description

Measurements of electrical resistance of thin films of the high-temperature superconductor Y1Ba2Cu3O/sub x/ have been carried out between 100 and 800 0C, and in the range between roughly 0.1 and 1 atm of ambient oxygen. Results are reported for both quick and slow heating, and also for sudden changes in oxygen partial pressure. At constant temperature we observe that the response to the oxygen partial pressure is both quick and reversible. We show evidence that quick heating is preferable, and we also observe features in the resistance similar to those reported in bulk samples and interpreted as an order--disorder transition of oxygen in the one-dimensional Cu-O chains

Additional details

Publishing Information

Journal Title
Appl. Phys. Lett.
Journal Volume
52
Journal Issue
2
Series
Appl. Phys. Lett.
Journal Page Range
157-159
ISSN
0003-6951
CODEN
APPLA