Pulsed laser deposition of carbon nanodots
- 1. Instituto de Física, Pontificia Universidad Católica de Chile, Av. Vicuña Mackenna 4860, Santiago (Chile)
- 2. Departamento de Física, Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Av. Blanco Encalada 2008, Santiago (Chile)
Description
We present preliminary results on carbon nanodots growth using pulsed laser deposition (PLD), with a graphite target, in a low pressure argon background. In the process thin carbon films are deposited on Porous Alumina Membranes (PAM) positioned over a Silicon substrate. Reproducible carbon nanodots arrays standing on Silicon are obtained by later removal of the PAM. Atomic force microscopy (AFM) was used to characterize the nanodots morphology. The laser carbon plasma was characterized by optical emission spectroscopy (OES), and a fast response, negative biased, Faraday cup was used to measure the characteristic energy and flux of the plasma ions depositing onto the PAM. Reliable Carbon nanodots growth was only observed with Argon background pressures below 18 mTorr. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/591/1/012047Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 591
- Journal Issue
- 1
- Journal Page Range
- [5 p.]
- ISSN
- 1742-6596
Conference
- Title
- 15. Latin American workshop on plasma physics; 21. IAEA technical meeting on research using small fusion devices (RUSFD)
- Acronym
- LAWPP 2014
- Dates
- 27-31 Jan 2014
- Place
- San Jose (Costa Rica)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47103856
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM OXIDES; ARGON; ATOMIC FORCE MICROSCOPY; EMISSION SPECTROSCOPY; ENERGY BEAM DEPOSITION; FARADAY CUPS; FILMS; GRAPHITE; IONS; LASER RADIATION; LASER-PRODUCED PLASMA; MORPHOLOGY; POROUS MATERIALS; PULSED IRRADIATION; QUANTUM DOTS; SILICON; SUBSTRATES
- Descriptors DEC
- ALUMINIUM COMPOUNDS; BEAM MONITORS; CARBON; CHALCOGENIDES; CHARGED PARTICLES; DEPOSITION; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; IRRADIATION; MATERIALS; MEASURING INSTRUMENTS; MICROSCOPY; MINERALS; MONITORS; NANOSTRUCTURES; NONMETALS; OXIDES; OXYGEN COMPOUNDS; PLASMA; RADIATIONS; RARE GASES; SEMIMETALS; SPECTROSCOPY; SURFACE COATING