Published June 28, 2016 | Version v1
Journal article

Effect of low-temperature post-growth annealing on anisotropic strain in epitaxial Fe layers deposited on GaAs(001)

  • 1. Institute of Nanostructure and Solid State Physics, Jungiusstrasse 11, D-20355 Hamburg (Germany)
  • 2. Photon Science, Deutschen Elektronensynchrotron (DESY), Notkestrasse 85, D-22607 Hamburg (Germany)

Description

We study the effect of low-temperature post growth annealing on the Fe layer in an epitaxial Fe/GaAs(001) heterojunction. High resolution X-ray diffraction and X-ray reflectivity were used to probe the Fe layer before and after annealing. No change in morphological features like annealing induced intermixing and thickness variation of the Fe layer are observed. However, annealing leads to increase in the compressive strain and improves isotropy of the ferromagnetic layer as revealed by measuring both lateral and out-of-plane lattice components.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
119
Journal Issue
24
Journal Page Range
vp.
ISSN
0021-8979
CODEN
JAPIAU

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Notes
(c) 2016 Author(s)