Published June 28, 2016
| Version v1
Journal article
Effect of low-temperature post-growth annealing on anisotropic strain in epitaxial Fe layers deposited on GaAs(001)
- 1. Institute of Nanostructure and Solid State Physics, Jungiusstrasse 11, D-20355 Hamburg (Germany)
- 2. Photon Science, Deutschen Elektronensynchrotron (DESY), Notkestrasse 85, D-22607 Hamburg (Germany)
Description
We study the effect of low-temperature post growth annealing on the Fe layer in an epitaxial Fe/GaAs(001) heterojunction. High resolution X-ray diffraction and X-ray reflectivity were used to probe the Fe layer before and after annealing. No change in morphological features like annealing induced intermixing and thickness variation of the Fe layer are observed. However, annealing leads to increase in the compressive strain and improves isotropy of the ferromagnetic layer as revealed by measuring both lateral and out-of-plane lattice components.
Additional details
Identifiers
- DOI
- 10.1063/1.4954872;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 119
- Journal Issue
- 24
- Journal Page Range
- vp.
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48041306
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANISOTROPY; ANNEALING; EPITAXY; GALLIUM ARSENIDES; HETEROJUNCTIONS; IRON; ISOTROPY; LAYERS; PROBES; REFLECTIVITY; RESOLUTION; STRAINS; TEMPERATURE RANGE 0065-0273 K; THICKNESS; X-RAY DIFFRACTION
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DIFFRACTION; DIMENSIONS; ELEMENTS; GALLIUM COMPOUNDS; HEAT TREATMENTS; METALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; PNICTIDES; SCATTERING; SEMICONDUCTOR JUNCTIONS; SURFACE PROPERTIES; TEMPERATURE RANGE; TRANSITION ELEMENTS
Optional Information
- Notes
- (c) 2016 Author(s)