Published August 2015 | Version v1
Journal article

High flux irradiations of Li coatings on polycrystalline W and ATJ graphite with D, He, and He-seeded D plasmas at Magnum PSI

  • 1. Department of Nuclear, Plasma, and Radiological Engineering, University of Illinois at Urbana-Champaign, Urbana, IL (United States)
  • 2. Micro and Nanotechnology Laboratory, Urbana, IL (United States)
  • 3. FOM Institute-DIFFER (Dutch Institute for Fundamental Energy Research), 3430 NE Nieuwegein (Netherlands)

Description

Lithium wall conditioning on PFCs (Plasma Facing Components) on a variety of substrate platforms (e.g. graphite, Mo, etc.) has resulted in improved plasma performance on multiple magnetic fusion devices. On graphite, this improvement occurs through the control of retention and recycling of hydrogen at the plasma–material interface by the chemical bonding of Li, O, and D at the surface. Moderate fluence (1 × 1021 m−2) studies of Li on W, performed in PRIHSM (Particle Radiation in Soft and Hard Matter), demonstrated that H retention is similar to Li on ATJ graphite but He ions, when mixed in a D beam, can inhibit the retention. To expand these studies closer to reactor relevant regimes like inside ITER, irradiations were carried out in Magnum-PSI at DIFFER up to fluences of ∼1025 m−2 with D, He, and He-seeded D plasmas (He 5–10%). Results show that D is still retained at higher fluxes and fluences

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2014.11.102

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2014.11.102;
PII
S0022-3115(14)00906-4;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
463
Journal Page Range
p. 1147-1151
ISSN
0022-3115
CODEN
JNUMAM

Conference

Title
21. international conference on plasma-surface interactions in controlled fusion devices
Acronym
Plasma-Surface Interactions 21
Dates
26-30 May 2014
Place
Kanazawa (Japan)

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.