Published March 15, 1999 | Version v1
Journal article

Study of local heat dissipation in semiconductor devices by thermally modulated atomic force microscopy

  • 1. Fakultaet fuer Physik und Astronomie, Festkoerperspektroskopie, Ruhr-Universitaet Bochum, D-44780 Bochum (Germany)
  • 2. Fakultaet fuer Physik und Astronomie, Angewandte Physik, Ruhr-Universitaet Bochum, D-44780 Bochum (Germany)

Description

The local heat dissipation in semiconductor devices were investigated by means of a thermally modulated scanning thermoelastic microscope (STEM). The temperature induced thermal expansion and the topographic information are measured simultaneously. The spatial resolution of the constructed microscope is better than 50 nm. Heat spots of the semiconducting devices are visualised by heating with a modulated voltage

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
463
Journal Issue
1
Journal Page Range
p. 152-154
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
10. International conference on photoacoustic and photothermal phenomena
Dates
23-27 Aug 1998
Place
Rome (Italy)

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40075791
Subject category
S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ATOMIC FORCE MICROSCOPY; COOLING; ELECTRIC POTENTIAL; HEAT; HEAT TRANSFER; HEATING; MICROSCOPES; PHOTOACOUSTIC SPECTROSCOPY; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; SPATIAL RESOLUTION; THERMAL EXPANSION; THERMOELASTICITY
Descriptors DEC
ELASTICITY; ENERGY; ENERGY TRANSFER; EXPANSION; MATERIALS; MECHANICAL PROPERTIES; MICROSCOPY; RESOLUTION; SPECTROSCOPY

Optional Information

Notes
(c) 1999 American Institute of Physics.