Published June 2, 2008
| Version v1
Journal article
Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens
Creators
- 1. Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
- 2. X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
- 3. Materials Science Division and Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
Description
We report improved results for hard x-ray focusing using a multilayer Laue lens (MLL). We have measured a line focus of 16 nm width with an efficiency of 31% at a wavelength λ=0.064 nm (19.5 keV) using a partial MLL structure with an outermost zone width of 5 nm. The results are in good agreement with the theoretically predicted performance
Additional details
Identifiers
- DOI
- 10.1063/1.2912503;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 92
- Journal Issue
- 22
- Journal Page Range
- p. 221114-221114.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40003289
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- EFFICIENCY; FOCUSING; HARD X RADIATION; KEV RANGE 10-100; LAYERS; LENSES; OPTICS; PERFORMANCE; WAVELENGTHS; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; ENERGY RANGE; IONIZING RADIATIONS; KEV RANGE; RADIATIONS; SCATTERING; X RADIATION
Optional Information
- Notes
- (c) 2008 American Institute of Physics