Published 1973
| Version v1
Book
CVD of boron
Creators
- 1. Laboratoire Suisse de Recherches Horlogeres, Neuchatel
Description
The deposition of boron on fine wires by the gas-phase reduction of its halides was studied with the aim of producing instrument and jewel bearings. The deposits are hard (HV0.05 = 3400 kp/mm2) and display good lubricant-free frictional behavior against titanium carbide. Deposits of 1.5 mm rod diameter were formed. Radial cracks caused by reaction with the substrate, and the different coefficients of thermal expansion, were observed. Prior deposition of boron nitride reduces diffusion of boron into the substrate, but complete elimination of all internal tensions has not been achieved as yet. (U.S.)
Additional details
Additional titles
- Augmented title (English)
- Deposition on wires
Publishing Information
- Publisher
- Electrochemical Society, Inc.
- Imprint Place
- Princeton, NJ
- Imprint Title
- Chemical vapor deposition
- Imprint Pagination
- p. 536-545.
Conference
- Title
- 4. international conference on chemical deposition vapor.
- Dates
- 7 Oct 1973.
- Place
- Boston, Massachusetts, USA.
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 6212698
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BORON; CHEMICAL VAPOR DEPOSITION; THERMAL EXPANSION; WIRES
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; ELEMENTS; EXPANSION; SEMIMETALS; SURFACE COATING
Optional Information
- Notes
- Imprint:See CONF-731017--.