Modeling of dust in a silane/hydrogen plasma
Creators
- 1. FOM Institute for Plasmaphysics 'Rijnhuizen', P.O. Box 1207, 3430 BE Nieuwegein (Netherlands)
Description
A dusty radio-frequency silane/hydrogen discharge is simulated, with the use of a one-dimensional fluid model. In the model, discharge quantities like the fluxes, densities, and electric field are calculated self consistently. A radius and an initial density profile for the spherical dust particles are given and the charge and the density of the dust are calculated with an iterative method. During the transport of the dust, its charge is kept constant in time. The dust influences the electric field distribution through its charge and the density of the plasma through recombination of positive ions and electrons at its surface. In the model this process gives an extra production of silane radicals, since the growth of dust is not included. Results are presented for situations in which the dust significantly changes the discharge characteristics, both by a strong reduction of the electron density and by altering the electric field by its charge. Simulations for dust with a radius of 2 μm show that the stationary solution of the dust density and the average electric field depend on the total amount of the dust. The presence of dust enhances the deposition rate of amorphous silicon at the electrodes because of the rise in the average electron energy associated with the decrease of the electron density and the constraint of a constant power input
Additional details
Identifiers
- DOI
- 10.1063/1.1578522;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 94
- Journal Issue
- 1
- Journal Page Range
- p. 104-109
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35060324
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- CATIONS; DUSTS; ELECTRIC FIELDS; ELECTRON DENSITY; HIGH-FREQUENCY DISCHARGES; HYDROGEN; ITERATIVE METHODS; PLASMA; PLASMA DENSITY; PLASMA SIMULATION; POWER INPUT; RADICALS; RECOMBINATION; SILANES
- Descriptors DEC
- CALCULATION METHODS; CHARGED PARTICLES; ELECTRIC DISCHARGES; ELEMENTS; HYDRIDES; HYDROGEN COMPOUNDS; IONS; NONMETALS; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; SILICON COMPOUNDS; SIMULATION
Optional Information
- Notes
- (c) 2003 American Institute of Physics.