AES-ion sputtering analysis and the surface composition of TiO2

Auger electron spectroscopy (AES) has emerged as a very powerful and popular analytical technique for the surface characterization in many manufacturing processes. In principle, one should be able to determine the surface composition, the depth compositional profile and the bulk stoichiometry using this method. However, accurate compositional characterization can be made only if the composition is not altered by the electron and ion bombardment. In this attempt to characterize the composition of thin TiO2 films, using the AES-ion sputtering technique, severe compositional changes were observed induced by the electron and ion bombardment. The changes yield erroneous information on film composition. (Auth.)