Published 1995 | Version v1
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Ageing of metal / ultra thin oxides / semiconductor structures under current injection by Fowler-Nordheim effect and X rays irradiation

  • 1. Laboratoire d'electronique appliquee L.E.A.A., (Morocco)
  • 2. Centre National de la Recherche Scientifique (CNRS), 31 - Toulouse (France). Lab. d'Automatique et d'Analyse des Systemes

Description

In this paper, we are investigating the aging effect by injection of currents (by Fowler-Nordheim FN effect) and irradiation (by X-rays) on metal / ultra thin oxide / semiconductor structures with oxide layers of thickness lying between 40 and 120 angstrom. We are particularly presenting the influence of oxide layer thickness, the dose of irradiation on the degradation of both oxide and oxide-semiconductor interface. (author)

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MF available from INIS under the Report Number.

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Additional details

Additional titles

Original title (French)
Vieillissement des structures metal / oxyde ultra-mince / semiconducteur sous injection de courants par effet fowler-nordheim et irradiation par rayons X

Publishing Information

Imprint Pagination
6 p.
Report number
CNRS-LAAS--95417

Conference

Title
Mediterranean conference on electronic and automatic control (MCEA-95).
Dates
13-15 Sep 1995.
Place
Grenoble (France).

Optional Information

Notes
15 refs.