Published January 2007 | Version v1
Journal article

Optical properties and thermal stability of GaAsN alloy films

  • 1. National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Science, 200083, Shanghai (China)
  • 2. Institute for Materials Research (IMR), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)
  • 3. Department of Physics, Fudan University, Shanghai, 200433 (China)

Description

The optical properties of GaAsN films have been studied by photoluminescence (PL) and photo-modulation reflection (PR). The effects of postgrowth anneal on the band structure and optical efficiency have been shown basing on these measurements. Both the samples with close N content grown at different temperatures exhibit high crystalline quality according to the X-ray diffraction. The alloy films show remarkable stability against rapid thermal annealing (RTA) process. The blueshift of the PL peak energy is found to be 3.8 meV when annealing up to 900 deg. C, meanwhile the PL intensity increases significantly until RTA at 850 deg. C

Additional details

Identifiers

DOI
10.1016/j.jlumin.2006.01.082;
PII
S0022-2313(06)00085-8;

Publishing Information

Journal Title
Journal of Luminescence
Journal Volume
122-123
Journal Page Range
p. 182-184
ISSN
0022-2313
CODEN
JLUMA8

Conference

Title
2005 international conference on luminescence and optical spectroscopy of condensed matter
Acronym
ICL'05
Dates
25-29 Jul 2005
Place
Beijing (China)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38034814
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; ARSENIC ALLOYS; GALLIUM ALLOYS; MOLECULAR BEAM EPITAXY; NITROGEN ADDITIONS; OPTICAL PROPERTIES; PEAKS; PHOTOLUMINESCENCE; REFLECTION; THIN FILMS; X-RAY DIFFRACTION
Descriptors DEC
ALLOYS; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DIFFRACTION; EMISSION; EPITAXY; FILMS; HEAT TREATMENTS; LUMINESCENCE; PHOTON EMISSION; PHYSICAL PROPERTIES; SCATTERING

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.