Published April 2016
| Version v1
Journal article
Induced surface states of the ultrathin Ba/3C-SiC(111) interface
Creators
- 1. Russian Academy of Sciences, Ioffe Physical–Technical Institute (Russian Federation)
- 2. Russian Academy of Sciences, Institute of Problems of Mechanical Engineering (Russian Federation)
- 3. Electronenspeicherring BESSY II D, Helmholtz-Zentrum Berlin fur Materialen und Energie (Germany)
Description
The electronic properties of the Ba/3C-SiC(111) nanointerface are for the first time studied by photoelectron spectroscopy with the use of synchrotron radiation in the energy range 80–450 eV. The experiments are performed in situ in ultrahigh vacuum for ultrathin Ba coatings on 3C-SiC(111) samples grown by a new method of substituting substrate atoms. It is found that the adsorption of Ba brings about the appearance of induced surface states with the binding energies 1.9, 6.2, and 7.5 eV. Evolution of the surface states and the spectra of the Si 2p and C 1s core levels shows that the Ba/3C-SiC(111) interface is formed due to charge transfer from Ba adatoms to surface Si atoms and underlying C atoms.
Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductors
- Journal Volume
- 50
- Journal Issue
- 4
- Journal Page Range
- p. 457-461
- ISSN
- 1063-7826
- CODEN
- SMICES
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48094159
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADSORPTION; BARIUM; BINDING ENERGY; CRYSTAL STRUCTURE; ENERGY LEVELS; INTERFACES; PHOTOELECTRON SPECTROSCOPY; PRESSURE RANGE MICRO PA; SILICON CARBIDES; SUBSTRATES; SURFACES; SYNCHROTRON RADIATION
- Descriptors DEC
- ALKALINE EARTH METALS; BREMSSTRAHLUNG; CARBIDES; CARBON COMPOUNDS; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY; METALS; PRESSURE RANGE; RADIATIONS; SILICON COMPOUNDS; SORPTION; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2016 Pleiades Publishing, Ltd.