Published September 1996 | Version v1
Journal article

Precision manufacturing using LIGA

  • 1. Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA 94720 (United States)
  • 2. Materials Synthesis Department, Sandia National Laboratory, Livermore, CA 94551 (United States)
  • 3. Center for Space Microelectronics Technology, Jet Propulsion Laboratory, Pasadena, CA 91109-8099 (United States)

Description

Our objective is the fabrication of small high-precision parts using LIGA, which can be used in a variety of industrial applications. LIGA is a combination of deep x-ray lithography, electroplating, and replication processes that enables the fabrication of microstructures with vertical dimensions several millimeters high, lateral dimensions in the micrometer range, and submicron tolerances. On beamline 10.3.2, at the Advanced Light Source (ALS), the Center for X-ray Optics (CXRO) has built an end station suitable for LIGA. The ALS is an excellent source of radiation for this application. The CXRO, in close collaboration with Sandia National Laboratory and the Jet Propulsion Laboratory, has developed the other essential process steps of mask making, resist development, x-ray exposure, and electroplating. This technology provides a powerful tool for mass production and miniaturization of mechanical systems into a dimensional regime not accessible by traditional manufacturing operations. We will present several applications that exploit the characteristics of the LIGA process: the fabrication of magnetic laminations for a high precision stepping motor; miniature octopole lens for advanced e-beam lithography; high-aspect-ratio x-ray collimating grids for astronomy; and microscopic tumblers for nuclear security. copyright 1996 American Institute of Physics

Additional details

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
67
Journal Issue
9
Journal Page Range
p. 3358.
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
synchrotron radiation instrumentation symposium; 7. users meeting for the advanced photon source (APS).
Acronym
SRI '95
Dates
16-20 Oct 1995.
Place
Argonne, IL (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
28013610
Subject category
S07: ISOTOPES AND RADIATION SOURCES; S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ADVANCED LIGHT SOURCE; FABRICATION; MANUFACTURING; MICROELECTRONICS; SYNCHROTRON RADIATION; USES; X-RAY EQUIPMENT; X-RAY SOURCES
Descriptors DEC
BREMSSTRAHLUNG; ELECTROMAGNETIC RADIATION; EQUIPMENT; RADIATION SOURCES; RADIATIONS; STORAGE RINGS; SYNCHROTRON RADIATION SOURCES

Optional Information

Secondary number(s)
CONF-9510119--.