Published September 2010 | Version v1
Journal article

Pentacene based thin film transistors with high-k dielectric Nd2O3 as a gate insulator

  • 1. J B College, Jorhat, Assam (India). Dept. of Physics. Thin Film Lab.
  • 2. Dibrugarh University, Dibrugarh, Assam (India)

Description

We have investigated the pentacene based Organic Thin Film Transistors (OTFTs) with high-k dielectric Nd2O3. Use of high dielectric constant (high-k) gate insulator Nd2O3 reduces the threshold voltage and sub threshold swing of the OTFTs. The calculated threshold voltage -2.2V and sub-threshold swing 1V/decade, current ON-OFF ratio is 1.7 X 104 and mobility is 0.13cm2/V.s. Pentacene film is deposited on Nd2O3 surface using two step deposition method. Deposited pentacene film is found poly crystalline in nature. (author)

Availability note (English)

Also available from http://www.scielo.br/pdf/bjp/v40n3/a19v40n3.pdf

Additional details

Publishing Information

Journal Title
Brazilian Journal of Physics
Journal Volume
40
Journal Issue
3
Journal Page Range
p. 357-360
ISSN
0103-9733
CODEN
BJPHE6