Published April 1, 2011 | Version v1
Journal article

Clear correspondence between magnetoresistance and magnetization of epitaxially grown ordered FeRh thin films

  • 1. Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan)
  • 2. Department of Applied Physics and Physico-Informatics, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522 (Japan)
  • 3. PRESTO, Japan Science and Technology Agency, 3-5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 (Japan)

Description

Magnetoresistance and magnetization of the CsCl-type ordered FeRh epitaxial thin films grown on MgO(001) substrates are investigated as a function of temperature and film thickness. All the films show a clear first-order magnetic phase transition from the antiferromagnetic state to the ferromagnetic state at around 380 K. A large negative variation in the field-dependent magnetoresistance of the FeRh thin films, which is accompanied by the field-induced magnetic phase transition, is found to be well scaled with the magnetization squared M2. The results indicate that the magnetoresistance primarily arises from spin-dependent scattering through the s-d exchange interactions between conduction electrons and the localized magnetic moments.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
109
Journal Issue
7
Journal Page Range
p. 07C717-07C717.3
ISSN
0021-8979
CODEN
JAPIAU

Conference

Title
55. annual conference on magnetism and magnetic materials
Dates
14-18 Nov 2010
Place
Atlanta, GA (United States)

Optional Information

Notes
(c) 2011 American Institute of Physics