Published April 1, 2011
| Version v1
Journal article
Clear correspondence between magnetoresistance and magnetization of epitaxially grown ordered FeRh thin films
- 1. Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan)
- 2. Department of Applied Physics and Physico-Informatics, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522 (Japan)
- 3. PRESTO, Japan Science and Technology Agency, 3-5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 (Japan)
Description
Magnetoresistance and magnetization of the CsCl-type ordered FeRh epitaxial thin films grown on MgO(001) substrates are investigated as a function of temperature and film thickness. All the films show a clear first-order magnetic phase transition from the antiferromagnetic state to the ferromagnetic state at around 380 K. A large negative variation in the field-dependent magnetoresistance of the FeRh thin films, which is accompanied by the field-induced magnetic phase transition, is found to be well scaled with the magnetization squared M2. The results indicate that the magnetoresistance primarily arises from spin-dependent scattering through the s-d exchange interactions between conduction electrons and the localized magnetic moments.
Additional details
Identifiers
- DOI
- 10.1063/1.3556754;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 109
- Journal Issue
- 7
- Journal Page Range
- p. 07C717-07C717.3
- ISSN
- 0021-8979
- CODEN
- JAPIAU
Conference
- Title
- 55. annual conference on magnetism and magnetic materials
- Dates
- 14-18 Nov 2010
- Place
- Atlanta, GA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43037667
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANTIFERROMAGNETIC MATERIALS; ANTIFERROMAGNETISM; DEPOSITION; ELECTRONS; EPITAXY; EXCHANGE INTERACTIONS; FERROMAGNETIC MATERIALS; IRON ALLOYS; MAGNESIUM OXIDES; MAGNETIC MOMENTS; MAGNETIZATION; MAGNETORESISTANCE; RHENIUM ALLOYS; SCATTERING; SPIN; SPUTTERING; SUBSTRATES; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0273-0400 K; THIN FILMS
- Descriptors DEC
- ALKALINE EARTH METAL COMPOUNDS; ALLOYS; ANGULAR MOMENTUM; CHALCOGENIDES; CRYSTAL GROWTH METHODS; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; ELEMENTARY PARTICLES; FERMIONS; FILMS; INTERACTIONS; LEPTONS; MAGNESIUM COMPOUNDS; MAGNETIC MATERIALS; MAGNETISM; MATERIALS; OXIDES; OXYGEN COMPOUNDS; PARTICLE PROPERTIES; PHYSICAL PROPERTIES; TEMPERATURE RANGE; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- (c) 2011 American Institute of Physics