Published January 7, 2016 | Version v1
Journal article

Resonant tunneling assisted propagation and amplification of plasmons in high electron mobility transistors

  • 1. Electrical and Computer Engineering Department, The Ohio State University, Columbus, OH 43212 (United States)
  • 2. Electrical and Computer Engineering Department, The University of Utah, Salt Lake City, UT 84112 (United States)
  • 3. Department of Electrical Engineering, University of Notre Dame, IN 46556 (United States)
  • 4. School of Electrical and Computer Engineering and Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853 (United States)
  • 5. Electrical and Computer Engineering Department and Materials Science Engineering Department, The Ohio State University, Columbus, OH 43212 (United States)

Description

A rigorous theoretical and computational model is developed for the plasma-wave propagation in high electron mobility transistor structures with electron injection from a resonant tunneling diode at the gate. We discuss the conditions in which low-loss and sustainable plasmon modes can be supported in such structures. The developed analytical model is used to derive the dispersion relation for these plasmon-modes. A non-linear full-wave-hydrodynamic numerical solver is also developed using a finite difference time domain algorithm. The developed analytical solutions are validated via the numerical solution. We also verify previous observations that were based on a simplified transmission line model. It is shown that at high levels of negative differential conductance, plasmon amplification is indeed possible. The proposed rigorous models can enable accurate design and optimization of practical resonant tunnel diode-based plasma-wave devices for terahertz sources, mixers, and detectors, by allowing a precise representation of their coupling when integrated with other electromagnetic structures

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
119
Journal Issue
1
Journal Page Range
p. 013102-013102.7
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
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