State-of-the-art technologies of gallium oxide power devices
- 1. National Institute of Information and Communications Technology, Koganei, Tokyo 184–8795 (Japan)
- 2. Tamura Corporation, Sayama, Saitama 350–1328 (Japan)
- 3. Tokyo University of Agriculture and Technology, Koganei, Tokyo 184–8588 (Japan)
Description
Gallium oxide (GaO) has gained increased attention for power devices due to its superior material properties and the availability of economical device-quality native substrates. This review illustrates recent advances in GaO device technologies, beginning with an overview of the social circumstances that motivate the development of new-generation switching devices. Following an introduction to the material properties of GaO from the viewpoint of power electronics, growth technologies of GaO bulk single crystals and epitaxial thin films are discussed. The fabrication and performance of state-of-the-art GaO transistors and diodes are then described. We conclude by identifying the directions and challenges of GaO power device development in the near future. (topical review)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6463/aa7affAdditional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 50
- Journal Issue
- 33
- Journal Page Range
- [12 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51029721
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- EPITAXY; FABRICATION; GALLIUM OXIDES; MONOCRYSTALS; SUBSTRATES; THIN FILMS; TRANSISTORS
- Descriptors DEC
- CHALCOGENIDES; CRYSTAL GROWTH METHODS; CRYSTALS; FILMS; GALLIUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES