Published August 23, 2017 | Version v1
Journal article

State-of-the-art technologies of gallium oxide power devices

  • 1. National Institute of Information and Communications Technology, Koganei, Tokyo 184–8795 (Japan)
  • 2. Tamura Corporation, Sayama, Saitama 350–1328 (Japan)
  • 3. Tokyo University of Agriculture and Technology, Koganei, Tokyo 184–8588 (Japan)

Description

Gallium oxide (Ga 2 O 3 ) has gained increased attention for power devices due to its superior material properties and the availability of economical device-quality native substrates. This review illustrates recent advances in Ga 2 O 3 device technologies, beginning with an overview of the social circumstances that motivate the development of new-generation switching devices. Following an introduction to the material properties of Ga 2 O 3 from the viewpoint of power electronics, growth technologies of Ga 2 O 3 bulk single crystals and epitaxial thin films are discussed. The fabrication and performance of state-of-the-art Ga 2 O 3 transistors and diodes are then described. We conclude by identifying the directions and challenges of Ga 2 O 3 power device development in the near future. (topical review)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6463/aa7aff

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
50
Journal Issue
33
Journal Page Range
[12 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51029721
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
EPITAXY; FABRICATION; GALLIUM OXIDES; MONOCRYSTALS; SUBSTRATES; THIN FILMS; TRANSISTORS
Descriptors DEC
CHALCOGENIDES; CRYSTAL GROWTH METHODS; CRYSTALS; FILMS; GALLIUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES