Published 2004 | Version v1
Miscellaneous Metadata-only

Structure of oxynitride films deposited by PECVD: dependence on gas mixture and deposition rate

Creators

  • 1. Sao Paulo Univ., SP (Brazil)

Description

no abstract available

Part of:
14. Annual meeting of the LNLS users - Abstracts

Additional details

Additional titles

Original title (English)
14. Reuniao anual de usuarios do LNLS - Resumos

Publishing Information

Imprint Title
14. Annual meeting of the LNLS users - Abstracts
Imprint Pagination
285 p.
Journal Page Range
p. 126

Conference

Title
14. Annual meeting of the LNLS users
Original Conference Title
14. Reuniao anual de usuarios do LNLS
Dates
9-11 Feb 2004
Place
Campinas, SP (Brazil)

INIS

Country of Publication
Brazil
Country of Input or Organization
Brazil
INIS RN
37082008
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
No Abstract, Conference, Non-conventional Literature
Descriptors DEI
ABSORPTION SPECTROSCOPY; ANNEALING; BRAZILIAN LNLS; CHEMICAL VAPOR DEPOSITION; FILMS; LNLS STORAGE RING; MOLECULAR STRUCTURE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SILICON NITRIDES; SILICON OXIDES; X-RAY SPECTROSCOPY
Descriptors DEC
BRAZILIAN ORGANIZATIONS; CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELEMENTS; HEAT TREATMENTS; NATIONAL ORGANIZATIONS; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PNICTIDES; RADIATION SOURCES; SEMIMETALS; SILICON COMPOUNDS; SPECTROSCOPY; STORAGE RINGS; SURFACE COATING; SYNCHROTRON RADIATION SOURCES

Optional Information

Notes
Imprint:14. Reuniao anual de usuarios do LNLS - Resumos