Published May 2004
| Version v1
Journal article
Shape dependence of the magnetization reversal in sub-μm magnetic tunnel junctions
Creators
Description
In order to get access to resistance of very small junctions with lateral sizes down to 100 nm and below, we have set up a home-built conducting atomic force microscope which is able to contact the individual junctions with the tip and measure the tunnel magnetoresistance (TMR). The junctions are patterned by standard electron beam lithography. The influence of the element shape is investigated by analysing their switching behaviour in TMR minor loops and asteroids. In addition, numerical simulations of the magnetization reversal are carried out and compared to the experiment
Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2003.12.412;
- PII
- S0304885303020870;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 272-276
- Journal Issue
- 6
- Journal Page Range
- p. E1475-E1476
- ISSN
- 0304-8853
- CODEN
- JMMMDC
Conference
- Title
- International conference on magnetism
- Acronym
- ICM 2003
- Dates
- 27 Jul - 1 Aug 2003
- Place
- Rome (Italy)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36022711
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; COMPARATIVE EVALUATIONS; ELECTRON BEAMS; MAGNETIZATION; MAGNETORESISTANCE; SHAPE; SIMULATION; STANDARDS; TUNNEL EFFECT
- Descriptors DEC
- BEAMS; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; EVALUATION; LEPTON BEAMS; MICROSCOPY; PARTICLE BEAMS; PHYSICAL PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.