Analysis of Ti/Mo film by X-ray photoelectron spectroscopy
- 1. China Academy of Engineering Physics, Mianyang (China). Inst. of Nuclear Physics and Chemistry
Description
Chemical elements and their electronic binding energy on surface of Ti film and bulk are analyzed by X-ray photoelectron spectroscopy (XPS) and Ar+ etching. The results show that the surface of specimens is contaminated by carbon and oxygen. Mo on surface of Ti film is from substrate. The XPS spectra of Ti 2p of the etched specimens are fitted on. The results show that Ti chemical states on surface of Ti film are TiO2 with a content of approaching to 100% and a little Ti. Some TiO2 will be reduced to low chemical states with the increasing of etching time. The chemical states of Mo on surface of Ti film are MoO3 and Mo. The content of Mo increases as etching time increasing. Chemical state of carbon on the surface of film is graphite and carbide with binding energy of 288.2-288.9 eV
Additional details
Publishing Information
- Journal Title
- Atomic Energy Science and Technology
- Journal Volume
- 36
- Journal Issue
- 4-5
- Journal Page Range
- p. 384-387
- ISSN
- 1000-6931
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 34039012
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ARGON IONS; BINDING ENERGY; CARBON; ETCHING; MOLYBDENUM; PHOTOELECTRON SPECTROSCOPY; SUBSTRATES; SURFACES; THIN FILMS; TITANIUM; X-RAY SPECTROSCOPY
- Descriptors DEC
- CHARGED PARTICLES; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY; FILMS; IONS; METALS; NONMETALS; REFRACTORY METALS; SPECTROSCOPY; SURFACE FINISHING; TRANSITION ELEMENTS